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Research Project: Reliability of wet chemical etching of silicon
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2007

Nguyen, Quoc Duy (2007) Electrochemistry in anisotropic etching of silicon in alkaline solutions. PhD thesis, University of Twente. ISBN 978-90-365-2551-0
Nguyen, Quoc Duy and Elwenspoek, M.C. (2007) Influence of applied potentials on anisotropic etching of silicon described using kinematic wave etch model. Journal of the Electrochemical Society, 154 (12). D684-D691. ISSN 0013-4651 *** ISI Impact 3,014 ***

2001

Kuiper, S. and van Wolferen, H.A.G.M. and van Rijn, C.J.M. and Nijdam, W. and Krijnen, G.J.M. and Elwenspoek, M.C. (2001) Fabrication of microsieves with sub-micron pore size by laser interference lithography. Journal of micromechanics and microengineering, 11 (1). pp. 33-37. ISSN 0960-1317 *** ISI Impact 1,768 ***
Nijdam, A.J. (2001) Anisotropic wet-chemical etching of silicon pits, peaks, principles, pyramids and particles. PhD thesis, University of Twente. ISBN 90 365 15351
Nijdam, A.J. and Gardeniers, J.G.E. and Berenschot, J.W. and Van Veenendaal, E. and Van Suchtelen, J. and Elwenspoek, M.C. (2001) Influence of the angle between etched (near) Si{111} surfaces and the substrate orientation on the underetch rate during anisotropic wet-chemical etching of silicon Journal of micromechanics and microengineering, 11 (5). pp. 499-503. ISSN 0960-1317 *** ISI Impact 1,768 ***
Nijdam, A.J. and Van Veenendaal, E. and Cuppen, H.M. and Van Suchtelen, J. and Reed, M.L. and Gardeniers, J.G.E. and Van Enckevort, W.J.P. and Vlieg, E. and Elwenspoek, M.C. (2001) Formation and stabilization of pyramidal etch hillocks on silicon {100} in anisotropic etchants: Experiments and Monte Carlo simulation Journal of applied physics, 89 (7). pp. 4113-4123. ISSN 0021-8979 *** ISI Impact 2,101 ***
van Veenendaal, E. and van Suchtelen, J. and van Beurden, P. and Cuppen, H.M. and van Enckevort, W.J.P. and Nijdam, A.J. and Elwenspoek, M.C. and Vlieg, E. (2001) Monte Carlo simulation of wet chemical etching of silicon. Sensors and materials, 13 (6). pp. 343-350. ISSN 0914-4935 *** ISI Impact 0,489 ***

2000

Nijdam, A.J. and Gardeniers, J.G.E. and Gui, C. and Elwenspoek, M.C. (2000) Etching pits and dislocations in Si{111} Sensors and actuators A: Physical, 86 (3). pp. 238-247. ISSN 0924-4247 *** ISI Impact 2,201 ***
Nijdam, A.J. and van Veenendaal, E. and Gardeniers, J.G.E. and Kentgens, A.P.M. and Nachtegaal, G.H. and Elwenspoek, M.C. (2000) 29Si-nuclear magnetic resonance on the etching products of silicon in potassium hydroxide solutions. Journal of the Electrochemical Society, 147 (6). pp. 2195-2198. ISSN 0013-4651 *** ISI Impact 3,014 ***
Oosterbroek, R.E. and Berenschot, J.W. and Jansen, H.V. and Nijdam, A.J. and Pandraud, G. and van den Berg, A. and Elwenspoek, M.C. (2000) Etching methodologies in <111>-oriented silicon wafers. Journal of microelectromechanical systems, 9 (3). pp. 390-398. ISSN 1057-7157 *** ISI Impact 1,939 ***
van Veenendaal, E. and van Beurden, P. and van Enckevort, W.J.P. and Vlieg, E. and van Suchtelen, J. and Elwenspoek, M.C. (2000) Monte Carlo study of kinetic smoothing during dissolution and etching of the Kossel (100) and silicon (111) surfaces. Journal of Applied Physics, 88 (8). pp. 4595-4604. ISSN 0021-8979 *** ISI Impact 2,101 ***
van Veenendaal, E. and van Suchtelen, J. and van Enckevort, W.J.P. and Sato, K. and Nijdam, A.J. and Gardeniers, J.G.E. and Elwenspoek, M.C. (2000) The construction of orientation-dependent crystal growth and etch rate functions II: Application to wet chemical etching of silicon in potassium hydroxide. Journal of applied physics, 87 (12). pp. 8732-8740. ISSN 0021-8979 *** ISI Impact 2,101 ***

1999

Nijdam, A.J. and Berenschot, J.W. and Van Suchtelen, J. and Gardeniers, J.G.E. and Elwenspoek, M.C. (1999) Velocity sources as an explanation for experimentally observed variations in Si{111} etch rates Journal of micromechanics and microengineering, 9 (2). pp. 135-138. ISSN 0960-1317 *** ISI Impact 1,768 ***
Nijdam, A.J. and Van Suchtelen, J. and Berenschot, J.W. and Gardeniers, J.G.E. and Elwenspoek, M.C. (1999) Etching of silicon in alkaline solutions: A critical look at the {111} minimum Journal of crystal growth, 198-199 (pt 1). pp. 430-434. ISSN 0022-0248 *** ISI Impact 1,462 ***
Oosterbroek, R.E. (1999) Modelling, design and realization of microfluidic components. PhD thesis, University of Twente. ISBN 90-36513464
Oosterbroek, R.E. and Berenschot, J.W. and Nijdam, A.J. and Pandraud, G. and Elwenspoek, M.C. and van den Berg, A. (1999) New design methodologies in <111>-oriented silicon wafers. In: Proceedings of SPIE - The International Society for Optical Engineering the 1999 Micromachining and Microfabrication Process Technology V, 20-22 Sept 1999, Santa Clara, CA, USA. pp. 384-394. Society of Photo-Optical Instrumentation Engineers. ISSN 0277-786X
Oosterbroek, R.E. and Berenschot, J.W. and Schlautmann, S. and Krijnen, G.J.M. and Lammerink, T.S.J. and Elwenspoek, M.C. and van den Berg, A. (1999) Designing, simulation and realization of in-plane operating micro valves, using new etching techniques. Journal of micromechanics and microengineering, 9 (2). pp. 194-198. ISSN 0960-1317 *** ISI Impact 1,768 ***

1998

Berenschot, J.W. and Oosterbroek, R.E. and Lammerink, T.S.J. and Elwenspoek, M.C. (1998) Micromachining of {111} plates in <001> oriented silicon Journal of micromechanics and microengineering, 8 (2). pp. 104-107. ISSN 0960-1317 *** ISI Impact 1,768 ***