EEMCS

Home > Publications
Home University of Twente
Education
Research
Prospective Students
Jobs
Publications
Intranet (internal)
 
 Nederlands
 Contact
 Search
 Organisation

EEMCS EPrints Service


Research Project: Plasma processing-induced damage of the MOS system
Home Policy Brochure Browse Search User Area Contact Help

2005

Wang, Zhichun and Ackaert, J.G.G. and Scarpa, A. and Salm, C. and Kuper, F.G. and Vugts, M. (2005) Strategies to cope with plasma charging damage in design and layout phases. In: IEEE International Conference in Integrated Circuit and Technology (ICICDT), 9-11 May 2005, Austin, Texas, USA. pp. 91-98. IEEE Computer Society. ISBN 0780390814

2004

Wang, Zhichun (2004) Detection of and protection against plasma charging damage in modern IC Technology. PhD thesis, University of Twente. ISBN 90-365-2079-7
Wang, Zhichun and Ackaert, J.G.G. and Salm, C. and Kuper, F.G. and de Backer, E. (2004) Plasma charging damage reduction in IC processing by a self-balancing interconnect. Microelectronics Reliability, 44 (9-11). pp. 1503-1507. ISSN 0026-2714 *** ISI Impact 1,202 ***
Wang, Zhichun and Ackaert, J.G.G. and Salm, C. and Kuper, F.G. and Tack, M. and de Backer, E. and Coppens, P. and de Schepper, L. and Vlachakis, B. (2004) Plasma-charging damage of floating MIM capacitors. IEEE transactions on electron devices, 51 (6). pp. 1017-1024. ISSN 0018-9383 *** ISI Impact 2,207 ***

2003

Wang, Zhichun and Ackaert, J.G.G. and Salm, C. and Kuper, F.G. and Bessemans, K. and de Backer, E. (2003) "Plasma charging damage induced by a power ramp down step in the end of plasma enhanced chemical vapour deposition (PECVD) process. In: Proceedings of the 6th annual workshop on Semiconductor Advances for Future Electronics and Sensors SAFE 2003, 25 - 26 November 2003, Veldhoven, The Netherlands. pp. 766-770. Technology Foundation STW. ISBN 90-73461-39-1

2002

Ackaert, J.G.G. and Wang, Zhichun and de Backer, E. and Coppens, P. (2002) Charging damage in floating metal-insulator-metal capacitors. In: 6th International Symposium on Plasma Process-Induced Damage, 13-15 May 2001, Monterey, California, USA. pp. 120-123. American Vacuum Society. ISBN 096515775X
Ackaert, J.G.G. and Wang, Zhichun and de Backer, E. and Coppens, P. (2002) Plasma damage in floating metal-insulator-metal capacitors. In: 8th International Symposium on the Physical & Failure Analysis of Integrated Circuits, 9 - 13 Jul 2001, Singapore, Thailand. pp. 224-227. IEEE Computer Society. ISBN 0-7803-6675-1
Ackaert, J.G.G. and Wang, Zhichun and de Backer, E. and Salm, C. (2002) Correlation between hot carrier stress, oxide breakdown and gate leakage current for monitoring plasma processing induced damage on gate oxide. In: 7th International symposium of Plasma Process-Induced Damage, 6-7 June 2002, Maui, Hawaii, USA. pp. 45-48. IEEE Computer Society. ISBN 0-9651577-7-6
Wang, Zhichun and Ackaert, J.G.G. and Salm, C. and de Backer, E. and van den Bosch, G. and Zawalski, W. (2002) Correlation between hot carrier stress, oxide breakdown and gate leakage current for monitoring plasma processing induced damage on gate oxide. In: 9th International Symposium on Physics and Failure Analysis 2002, 8-12-Jul 2002, Singapore, Thailand. pp. 242-245. IEEE Computer Society. ISBN 0-7803-7416-9
Wang, Zhichun and Scarpa, A. and Smits, S.M. and Kuper, F.G. and Salm, C. (2002) Temperature effect on protection diode for plasma-process induced charging damage. In: Proceedings of the 5th annual workshop on Semiconductors Advances for Future Electronics SAFE 2002, 27-28 November 2002, Veldhoven, The Netherlands. pp. 127-130. Technology Foundation STW. ISBN 90-73461-33-2
Wang, Zhichun and Scarpa, A. and Smits, S.M. and Salm, C. and Kuper, F.G. (2002) Temperature effect on antenna protection strategy for plasma-process induced charging damage. In: 7th International symposium of Plasma Process-Induced Damage, 6-7 June 2002, Maui, Hawaii, USA. pp. 134-137. IEEE Computer Society. ISBN 0965157776

2001

Ackaert, J.G.G. and Wang, Zhichun and De Backer, E. and Colson, P. and Coppens, P. (2001) Non contact surface potential measurements for charging reduction during manufacturing of metal-insulator-metal capacitors. Microelectronics Reliability, 41 (9-10). pp. 1403-1407. ISSN 0026-2714 *** ISI Impact 1,202 ***
Wang, Zhichun and Ackaert, J.G.G. and Salm, C. and Kuper, F.G. (2001) Charging induced damage on complex-antenna test structures. In: Proceedings of the 4th annual workshop on Semiconductor Advances for Future Electronics and Sensors SAFE 2001, 28-30 Nov 2001, Veldhoven, The Netherlands. pp. 220-223. Technology Foundation STW. ISBN 90-73461-29-4
Wang, Zhichun and Ackaert, J.G.G. and Salm, C. and Kuper, F.G. (2001) Plasma process-induced latent damage on gate oxide - demonstrated by single-layer and multi-layer antenna structures. In: 8th International Symposium on the Physical & Failure Analysis of Integrated Circuits, 9-13 Jul 2001, Singapore, Thailand. pp. 220-223. IEEE Computer Society. ISBN 0-7803-6675-1
Wang, Zhichun and Scarpa, A. and Salm, C. and Kuper, F.G. (2001) Relation between plasma process-induced oxide failure fraction and antenna ratio. In: 6th International Symposium on Plasma Process-Induced Damage, 13-15 May 2001, Monterey, California, USA. pp. 16-19. IEEE Computer Society. ISBN 0-9651577-5-X