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2013
Van Hao, B. and Kovalgin, A.Y. and Aarnink, A.A.I. and Wolters, R.A.M.
(2013)
Hot-Wire generated atomic hydrogen and its impact on thermal ALD in TiCl4/NH3 System
ECS Journal of Solid State Science and Technology, 2 (4).
pp. 149-155.
ISSN 2162-8769
Van Hao, B. and Kovalgin, A.Y. and Wolters, R.A.M.
(2013)
On the difference between optically and electrically determined resistivity of ultra-thin titanium nitride films.
In: SURFINT-SREN III, 14-19 May 2012, Florence, Italy.
pp. 45-49.
Applied Surface Science 269.
Elsevier.
ISSN 0169-4332
2012
Van Hao, B. and Kovalgin, A.Y. and Wolters, R.A.M.
(2012)
Growth of sub-nanometer thin continuous TiN films by atomic layer deposition.
ECS Journal of Solid State Science and Technology, 1 (6).
pp. 285-290.
ISSN 2162-8769
Van Hao, B. and Wolters, R.A.M. and Kovalgin, A.Y.
(2012)
TiN films by Atomic Layer Deposition: Growth and electrical characterization down to sub-nm thickness.
(Invited)
In: Proceedings of the International Conference on Anvanced Materials and Nanotechnology (ICAMN 2012), 13-14 Dec 2012, Hanoi, Vietnam.
pp. 7-12.
Hanoi University of Science and Technology.
ISBN 978-604-911-247-8
2011
Van Hao, B. and Aarnink, A.A.I. and Kovalgin, A.Y. and Wolters, R.A.M.
(2011)
Ultra-Thin Atomic Layer Deposited TiN Films: Non-Linear I–V Behaviour and the Importance of Surface Passivation.
Journal of nanoscience and nanotechnology, 11 (9).
pp. 8120-8125.
ISSN 1533-4880
*** ISI Impact 1,563 ***
Van Hao, B. and Groenland, A.W. and Aarnink, A.A.I. and Wolters, R.A.M. and Schmitz, J. and Kovalgin, A.Y.
(2011)
Growth Kinetics and Oxidation Mechanism of ALD TiN Thin Films Monitored by In Situ Spectroscopic Ellipsometry.
Journal of the Electrochemical Society, 158 (3).
pp. 214-220.
ISSN 0013-4651
*** ISI Impact 2,590 ***
2009
Aarnink, A.A.I. and Van Bui, B. and Kovalgin, A.Y. and Wolters, R.A.M.
(2009)
In-situ monitoring of growth and oxidation of ALD TiN layers followed by reduction in atomic hydrogen.
In: Proceedings of the 9th International conference on Atomic Layer Deposition, 19-22 Jul 2009, Monterey, CA, USA.
America Vaccum Society, Omnipress.
ISBN not assigned
Van Hao, B. and Aarnink, A.A.I. and Kovalgin, A.Y. and Wolters, R.A.M. and Schmitz, J.
(2009)
Thermal atomic layer deposition and oxidation of TiN monitored by in-situ spectroscopic ellipsometry.
In: Proceedings of the 12th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, 26-27 Nov 2009, Veldhoven, The Netherlands.
pp. 59-62.
Technology Foundation STW.
ISBN 978-90-73461-62-8
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