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Research Project: DILEMMA: Dielectric Limits for Embedded nonvolatile Memory Applications
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2006

Salm, C. and Hoekstra, E. and Kolhatkar, J.S. and Hof, A.J. and Wallinga, H. and Schmitz, J. (2006) Low-Frequency noise in hot-carrier degraded MOSFETs. In: 14th workshop on dielectrics in microelectronics WODIM, 26-28 june 2006, Santa Tecla, Italy. pp. 64-65. ISBN not assigned

2005

Hof, A.J. and Hoekstra, E. and Kovalgin, A.Y. and van Schaijk, R. and Baks, W.M. and Schmitz, J. (2005) The impact of deuterated CMOS processing on gate oxide reliability. IEEE Transactions on Electron Devices, 52 (9). pp. 2111-2115. ISSN 0018-9383 *** ISI Impact 2,207 ***
Hof, A.J. and Kovalgin, A.Y. and Woerlee, P.H. and Schmitz, J. (2005) On the oxidation kinetics of silicon in ultradiluted H2O and D2O ambient Journal of the Electrochemical Society, 152 (9). F133-F137. ISSN 0013-4651 *** ISI Impact 3,014 ***
Kovalgin, A.Y. and Hof, A.J. and Schmitz, J. (2005) An approach to modeling of silicon oxidation in a wet ultra-diluted ambient. Microelectronic Engineering, 80. pp. 432-435. ISSN 0167-9317 *** ISI Impact 1,277 ***

2004

Hof, A.J. (2004) Deuterium in the gate dielectric if CMOS devices. PhD thesis, University of Twente. ISBN 90-365-2093-2
Hof, A.J. and Kovalgin, A.Y. and van Schaijk, R. and Baks, W.M. and Schmitz, J. (2004) Gate oxide reliability and deuterated CMOS processing. In: IEEE Integrated Reliability Workshop, 18-21 October 2004, Lake Tahoe, USA. pp. 7-10. IEEE Computer Society. ISBN 0-7803-8517-9
Schmitz, J. and Weusthof, M.H.H. and Hof, A.J. (2004) Leakage current correction in quasi-static C-V measurements. In: International Conference of Microelectronic Test Structures ICMTS 2004, 22-25 March 2004, Awaji Yumebutai, Japan. pp. 179-181. IEEE Computer Society. ISBN 0780382625

2003

Hof, A.J. and Kovalgin, A.Y. and Woerlee, P.H. and Schmitz, J. (2003) On oxidation kinetics and electrical quality of gate oxide grown in H2O or D2O ambient In: Proceedings of the 6th annual workshop on Semiconductor Advances for Future Electronics and Sensors SAFE 2003, 25 - 26 November 2003, Veldhoven, The Netherlands. pp. 743-747. Technology Foundation STW. ISBN 90-73461-39-1

2002

Hof, A.J. and Kovalgin, A.Y. and Woerlee, P.H. (2002) Comparison of H2O and D2O oxidation kinetics of <100> silicon In: Proceedings of the 5th annual workshop on Semiconductors Advances for Future Electronics SAFE 2002, 27-28 November 2002, Veldhoven, The Netherlands. pp. 35-38. Technology Foundation STW. ISBN 90-73461-33-2

2001

Hof, A.J. and Holleman, J. and Woerlee, P.H. (2001) Gate current for p+-poly PMOS devices under gate injection conditions. In: Proceedings of the 4th annual workshop on Semiconductor Advances for Future Electronics and Sensors SAFE 2003, 28-30 Nov 2001, Veldhoven, The Netherlands. pp. 72-75. Technology Foundation STW. ISBN 90-73461-29-4
Nguyen, Viet Hoang and Hof, A.J. and van Kranenburg, H. and Woerlee, P.H. and Weimar, F. (2001) Copper chemical mechanical polishing using a slurry-free technique. Microelectronic engineering, 55 (1-4). pp. 305-312. ISSN 0167-9317 *** ISI Impact 1,277 ***