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2003
Nguyen, Viet Hoang and Daamen, R. and van Kranenburg, H. and van der Velden, P. and Woerlee, P.H.
(2003)
A physical model for dishing during metal CMP.
Journal of the Electrochemical Society, 150 (11).
G689-G693.
ISSN 0013-4651
*** ISI Impact 2,420 ***
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