EEMCS

Home > Publications
Home University of Twente
Education
Research
Prospective Students
Jobs
Publications
Intranet (internal)
 
 Nederlands
 Contact
 Search
 Organisation

EEMCS EPrints Service


Research Project: CU-CMP: Chemical-Mechanical Polishing of Metal Layers
Home Policy Brochure Browse Search User Area Contact Help

2003

Nguyen, Viet Hoang and Daamen, R. and van Kranenburg, H. and van der Velden, P. and Woerlee, P.H. (2003) A physical model for dishing during metal CMP. Journal of the Electrochemical Society, 150 (11). G689-G693. ISSN 0013-4651 *** ISI Impact 3,014 ***