EEMCS EPrints Service
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2008
van der Vegt, J.J.W. and Sudirham, J.J.
(2008)
A space-time discontinuous Galerkin method for the time-dependent Oseen equations.
Applied numerical mathematics, 58 (12).
pp. 1892-1917.
ISSN 0168-9274
*** ISI Impact 0,919 ***
2007
Svetovoy, V.
(2007)
Evanescent character of the repulsive thermal casimir force.
Physical review A, 76 (6).
062102-1-062102-4.
ISSN 1050-2947
*** ISI Impact 2,861 ***
Svetovoy, V. and Berenschot, J.W. and Elwenspoek, M.C.
(2007)
Experimental investigation of anisotropy in isotropic silicon etching.
Journal of micromechanics and microengineering, 17 (11).
pp. 2344-2351.
ISSN 0960-1317
*** ISI Impact 2,276 ***
2006
Antezza, M. and Pitaevskii, L.P. and Stringari, S. and Svetovoy, V.
(2006)
Casimir-lifshitz force out of thermal equilibrium and asymptotic nonadditivity.
Physical review letters, 97.
223203.
ISSN 0031-9007
*** ISI Impact 7,621 ***
Sudirham, J.J. and van der Vegt, J.J.W. and van Damme, R.M.J.
(2006)
Space-time discontinuous Galerkin method for advection-diffusion problems on time-dependent domains.
Applied Numerical Mathematics, 56 (12).
pp. 1491-1518.
ISSN 0168-9274
*** ISI Impact 0,919 ***
Svetovoy, V. and Berenschot, J.W. and Elwenspoek, M.C.
(2006)
Precise test of the diffusion-controlled wet isotropic etching of silicon via circular mask openings.
Journal of the Electrochemical Society, 153 (9).
C641-C647.
ISSN 0013-4651
*** ISI Impact 2,420 ***
Svetovoy, V. and Berenschot, J.W. and Elwenspoek, M.C.
(2006)
Experimental verification of the diffusion theory for wet isotropic etching of si via circular mask openings.
In: Fifth International Workshop on Physical Chemistry of Wet Etching of Semiconductors, 19-21 June 2006, Saarbrücken, Germany.
University of Saarbrücken.
ISBN not assigned
2005
Esquivel, R. and Svetovoy, V.
(2005)
Nonlocal thin films in calculations of the casimir force.
Physical review B: Condensed matter and materials physics, 72 (4).
45443.
ISSN 1098-0121
*** ISI Impact 3,772 ***
Sudirham, J.J.
(2005)
Space-Time Discontinuous Galerkin Methods for Convection-Diffusion Problems - Application to Wet-Chemical Etching.
PhD thesis, University of Twente.
ISBN 90-365-2287-0
Svetovoy, V. and Esquivel, R.
(2005)
Nonlocal impedances and the casimir entropy at low temperatures.
Physical review E Statistical, nonlinear, and soft matter physics, 72 (3).
36113.
ISSN 1539-3755
*** ISI Impact 2,352 ***
2004
Esquivel, R. and Svetovoy, V.
(2004)
Correction to the casimir force due to the anomalous skin effect.
Physical review A, 69 (6).
62102.
ISSN 1050-2947
*** ISI Impact 2,861 ***
Sudirham, J.J. and van Damme, R.M.J. and van der Vegt, J.J.W.
(2004)
Space-time discontinuous Galerkin method for wet-chemical etching of mircrostructures.
In: Proceedings of Fourth European Congress on Computational Methods in Applied Sciences, ECCOMAS 2004, 24-28 July 2004, Jyväskylä, Finland.
pp. 1-17.
University of Jyväskylä.
ISBN 9513918688
Svetovoy, V.
(2004)
Comment on "Surface-impedance approach solves problems with the thermal Casimir force between real metals".
Physical review A, 70.
16101.
ISSN 1050-2947
*** ISI Impact 2,861 ***
2001
Van Veenendaal, E. and Cuppen, H.M. and Van Enckevort, W.J.P. and Van Suchtelen, J. and Nijdam, A.J. and Elwenspoek, M.C. and Vlieg, E.
(2001)
A Monte Carlo study of etching in the presence of a mask junction.
Journal of micromechanics and microengineering, 11 (4).
pp. 409-415.
ISSN 0960-1317
*** ISI Impact 2,276 ***
2000
Van Veenendaal, E. and Nijdam, A.J. and Van Suchtelen, J. and Sato, K. and Gardeniers, J.G.E. and Van Enckevort, W.J.P. and Elwenspoek, M.C.
(2000)
Simulation of anisotropic wet chemical etching using a physical model.
Sensors and actuators A: Physical, 84 (3).
pp. 324-329.
ISSN 0924-4247
*** ISI Impact 1,933 ***
1999
Van Suchtelen, J. and Sato, K. and Van Veenendaal, E. and Nijdam, A.J. and Gardeniers, J.G.E. and Van Enckevort, W.J.P. and Elwenspoek, M.C.
(1999)
Simulation of anisotropic wet-chemical etching using a physical model.
In: Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS), 17 - 21 Jan 1999, Orlando, FL, USA.
pp. 332-337.
IEEE Computer Society.
ISBN 0-7803-5194-0
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