EEMCS

Li, Yuan and Donnet, D. and Grzegorczyk, A. and Cavelaars, J. and Kuper, F.G. (2010) Assessing the degradation mechanisms and current limitation design rules of SICR-based thin-film resistors in integrated circuits. In: Proceedings of the IEEE International Reliability Physics Symposium 2010 (IRPS), 2-6 May 2010, Anaheim, CA, USA. pp. 724-730. IEEE Computer Society. ISBN 978-1-4244-5430-3

Li, Yuan and Veenstra, K.J. and Dubois, J. and Peters-Wu, L. and van Zomeren, A.A. and Kuper, F.G. (2003) Reservoir effect and maximum allowed VIA misalignment for AICu interconnect with tungsten VIA plug. Microelectronics Reliability, 43 (9-11). pp. 1449-1454. ISSN 0026-2714 *** ISI Impact 1,066 ***