EEMCS

Roy, D. and Klootwijk, J.H. and Gravesteijn, D.J. and Wolters, R.A.M. (2011) Contact resistance of TiW to ultra-thin phase change material layers. In: 2011 Proceedings of the 41st European Solid-State Device Research Conference (Essderc), 12-16 Sep 2011, Helsinki, Finland. pp. 87-90. IEEE Solid-State Circuits Society. ISBN 978-1-4577-0708-7

Roy, D. and Klootwijk, J.H. and Verhaegh, N.A.M. and Roosen, H.H.A.J. and Wolters, R.A.M. (2009) Comb Capacitor Structures for On-Chip Physical Uncloneable Function. IEEE Transactions on Semiconductor Manufacturing, 22 (1). pp. 96-102. ISSN 0894-6507 *** ISI Impact 0,748 ***

Roy, D. and in 't Zandt, M.A.A. and Wolters, R.A.M. and Timmering, C.E. and Klootwijk, J.H. (2009) Contact resistance of TiW to phase change material in the amorphous and crystalline states. In: Proceedings of 10th Non-Volatile Memory Technology Symposium (NVMTS) 2009, 25-28 Oct. 2009, Portland, OR, USA. pp. 12-15. IEEE. ISBN 978-1-4244-4954-5

Stavitski, N. and Klootwijk, J.H. and van Zeijl, H.W. and Kovalgin, A.Y. and Wolters, R.A.M. (2009) Cross-Bridge Kelvin resistor structures for reliable measurement of low contact resistances and contact interface characterization. IEEE Transactions on Semiconductor Manufacturing, 22 (1). pp. 146-152. ISSN 0894-6507 *** ISI Impact 0,748 ***

Jinesh, K.B. and Lamy, Y. and Wolters, R.A.M. and Klootwijk, J.H. and Tois, E. and Roozeboom, F. and Besling, W.F.A. (2008) Silicon out-diffusion and aluminum in-diffusion in devices with atomic-layer deposited La₂O₃ thin films Applied physics letters, 93 (19). 192912. ISSN 0003-6951 *** ISI Impact 3,820 ***

Roy, D. and Klootwijk, J.H. and Verhaegh, N.A.M. and Roosen, H.H.A.J. and Wolters, R.A.M. (2008) Comb capacitor structures for measurement of post-processed layers. In: Proceedings of the 21st ICMTS 2008 IEEE Conference on Microelectronic Test Structures, 24-28 Mar 2008, Edinburgh, Schotland. pp. 205-209. IEEE Computer Society. ISBN 978-1-4244-1801-5

Roy, D. and in 't Zandt, M.A.A. and Delhounge, R. and Klootwijk, J.H. and Wolters, R.A.M. (2008) Influence of interfacial layer on contact resistance. In: Proceedings of the 11th annual workshop on semiconductor advances for future electronics and sensors (SAFE 2008), 27-28 Nov 2008, Veldhoven, The Netherlands. pp. 499-500. Technology Foundation STW. ISBN 978-90-73461-56-7

Stavitski, N. and Klootwijk, J.H. and van Zeijl, H.W. and Kovalgin, A.Y. and Wolters, R.A.M. (2008) A study of cross-bridge kelvin resistor structures for reliable measurement of low contact resistances. In: Proceedings of the 21st ICMTS 2008 IEEE Conference on Microelectronic Test Structures, 24-28 Mar 2008, Edinburgh, Schotland. pp. 199-204. IEEE Computer Society. ISBN 978-1-4244-1801-5

Stavitski, N. and Klootwijk, J.H. and van Zeijl, H.W. and Boksteen, B.K. and Kovalgin, A.Y. and Wolters, R.A.M. (2007) Cross-bidge Kelvin resistor (CBKR) structures for measurement of low contact resistances. In: 10th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors (SAFE), 29-30 Nov 2007, Veldhoven, The Netherlands. pp. 551-554. Technology Foundation STW. ISBN 978-90-73461-49-9

Stavitski, N. and van Dal, M.J.H. and Klootwijk, J.H. and Wolters, R.A.M. and Kovalgin, A.Y. and Schmitz, J. (2006) Cross-Bridge Kelvin Resistor (CBKR) structures for silicide-semiconductor junctions characterization. In: Proceedings of the 9th annual workshop on Semiconductor Advances for Future Electronics and Sensors 2006, 23-24 Nov 2006, Veldhoven, The Netherlands. pp. 436-438. Technology Foundation STW. ISBN 978-90-73461-44-4