EEMCS

de Boer, M.J. and Gardeniers, J.G.E. and Jansen, H.V. and Smulders, E.J.T. and Gilde, M.-J. and Roelofs, G.H.M. and Sasserath, J.N. and Elwenspoek, M.C. (2002) Guidelines for etching silicon MEMS structures using fluorine high-density plasmas at cryogenic temperatures. Journal of microelectromechanical systems, 11 (4). pp. 385-401. ISSN 1057-7157 *** ISI Impact 2,157 ***