EEMCS

Cubaynes, F.N. (2004) Ultra-thin plasma nitrided oxide gate dielectrics for advanced MOS transistors. PhD thesis, University of Twente. ISBN 90-365-2059-2

Schmitz, J. and Cubaynes, F.N. and Havens, R.J. and de Kort, R. and Scholten, A.J. and Tiemeijer, L.F. (2004) Test structures design considerations for RF-CV measurements on leaky dielectrics. IEEE transactions on semiconductor manufacturing, 17 (2). pp. 150-154. ISSN 0894-6507 *** ISI Impact 0,748 ***

Schmitz, J. and Cubaynes, F.N. and de Kort, R. and Havens, R.J. and Scholten, A.J. and Tiemeijer, L.F. (2004) The RF-CV method for characterization of leaky gate dielectrics. Microelectronic engineering, 72. pp. 149-153. ISSN 0167-9317 *** ISI Impact 1,569 ***

Cubaynes, F.N. and Schmitz, J. and van der Marel, C. and Snijders, J.H.M. and Veloso, A. and Rothschild, A. and Olsen, C. and Date, L. (2003) Plasma nitridation optimization for sub-15 A gate dielectrics. In: Symposium on silicon nitride and silicon dioxide thin insulating films, 28 April - 2 May 2003, Paris, France. pp. 595-604. The Electrochemical Society. ISSN 0161-6374 ISBN 1566773474

Schmitz, J. and Cubaynes, F.N. and Havens, R.J. and de Kort, R. and Scholten, A.J. and Tiemeijer, L.F. (2003) RF capacitance-voltage characterization of MOSFETs with high-leakage dielectric. IEEE Electron Device Letters, 24 (1). pp. 37-39. ISSN 0741-3106 *** ISI Impact 2,714 ***

Schmitz, J. and Cubaynes, F.N. and Havens, R.J. and de Kort, R. and Scholten, A.J. and Tiemeijer, L.F. (2003) Test structure design considerations for RF-CV measurements on leaky dielectrics. In: International Conference on Microelectronic Test Structures, 2003, 17-20 March 2003, Monterey, California, USA. pp. 181-185. IEEE Computer Society. ISBN 0780376536