EEMCS EPrints Service
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2009
Brombacher, C. and Saitner, M. and Pfahler, C. and Plettl, A. and Ziemann, P. and Makarov, D. and Assmann, D. and Siekman, M.H. and Abelmann, L. and Albrecht, M.
(2009)
Tailoring particle arrays by isotropic plasma etching: an approach towards percolated perpendicular media.
Nanotechnology, 20 (10).
pp. 105304-105308.
ISSN 0957-4484
*** ISI Impact 3,644 ***
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