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1990
Eijkel, C.J.M. and Branebjerg, J. and Elwenspoek, M.C. and van de Pol, F.C.M.
(1990)
A new technology for micromachining of silicon: Dopant selective HF anodic etching for the realization of low-doped monocrystalline silicon structures.
IEEE electron device letters, 11 (12).
pp. 588-589.
ISSN 0741-3106
*** ISI Impact 2,714 ***
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