EEMCS

Boogaard, A. (2011) Plasma-enhanced chemical vapor deposition of silicon dioxide : optimizing dielectric films through plasma characterization. PhD thesis, University of Twente. ISBN 978-90-365-3130-6

Boogaard, A. and Kovalgin, A.Y. and Wolters, R.A.M. (2011) Negative Charge in Plasma Oxidized SiO₂ Layers In: 219th ECS Meeting, 1 - 6 May 2011, Montreal QC, Canada. pp. 259-272. The Electrochemical Society. ISSN 1938-5862

Boogaard, A. and Kovalgin, A.Y. and Wolters, R.A.M. (2009) Net Negative Charge in low-temperature SiO₂ gate dielectric layers Microelectronic engineering, 86 (7-9). pp. 1707-1710. ISSN 0167-9317 *** ISI Impact 1,569 ***

Brunets, I. and Boogaard, A. and Smits, S.M. and de Vries, H. and Aarnink, A.A.I. and Holleman, J. and Kovalgin, A.Y. and Schmitz, J. (2009) Low temperature TFTs with poly-stripes. In: Proceedings of the 5th International Thin Film Transistor Conference ITC'09, 5-6 Mar 2009, Palaiseau, France. pp. 62-65. Ecole Polytechnique. ISBN not assigned

Brunets, I. and Holleman, J. and Kovalgin, A.Y. and Boogaard, A. and Schmitz, J. (2009) Low-temperature fabricated TFTs on polysilicon stripes. IEEE transactions on electron devices, 56 (8). pp. 1637-1644. ISSN 0018-9383 *** ISI Impact 2,255 ***

Kovalgin, A.Y. and Boogaard, A. and Brunets, I. and Aarnink, A.A.I. and Wolters, R.A.M. (2009) Electrical properties of plasma-deposited silicon oxide clarified by chemical modeling. ECS Transactions, 25 (8). pp. 23-32. ISSN 1938-5862

Kovalgin, A.Y. and Boogaard, A. and Wolters, R.A.M. (2009) Impact of small deviations in EEDF on silane-based plasma chemistry. ECS Transactions, 25 (8). pp. 429-436. ISSN 1938-5862

Rajasekharan, B. and Salm, C. and Wolters, R.A.M. and Aarnink, A.A.I. and Boogaard, A. and Schmitz, J. (2009) Metal contacts to lowly doped Si and ultra thin SOI. In: Proceedings of Fifth Workshop of the Thematic Network on Silicon on Insulator Technology, Devices and Circuits, 19-21 Jan 2009, Gotheburg, Sweden. pp. 29-30. Chalmers University of Technology. ISBN not assigned

Boogaard, A. and Roesthuis, R. and Brunets, I. and Aarnink, A.A.I. and Kovalgin, A.Y. and Holleman, J. and Wolters, R.A.M. and Schmitz, J. (2008) Deposition of High-Quality SiO₂ Insulating Films at Low Temperatures by means of Remote PECVD In: Proceedings of the 11th annual workshop on semiconductor advances for future electronics and sensors (SAFE 2008), 27-28 Nov 2008, Veldhoven, The Netherlands. pp. 452-456. Technology Foundation STW. ISBN 978-90-73461-56-7

Brunets, I. and Groenland, A.W. and Boogaard, A. and Aarnink, A.A.I. and Kovalgin, A.Y. (2008) A study of thermal oxidation and plasma-enhanced oxidation/reduction of ALD TiN layers. In: Proceedings of the 18th International Conference on Atomical Layer Deposition ALD 2008, 29 Jun - 2 Jul 2008, Bruges, Belgium. P-54. TUe Eindhoven. ISBN not assigned

Brunets, I. and van Loon, R.V.A. and Walters, R.J. and Polman, A. and Boogaard, A. and Aarnink, A.A.I. and Kovalgin, A.Y. and Wolters, R.A.M. and Holleman, J. and Schmitz, J. (2008) Light emission from silicon nanocrystals embedded in ALD-alumina at low temperatures. In: Proceedings of the 11th annual workshop on semiconductor advances for future electronics and sensors (SAFE 2008), 27-28 Nov 2008, Veldhoven, The Netherlands. pp. 399-402. Technology Foundation STW. ISBN 978-90-73461-56-7

Groenland, A.W. and Brunets, I. and Boogaard, A. and Aarnink, A.A.I. and Kovalgin, A.Y. and Schmitz, J. (2008) Thermal and plasma-enhanced oxidation of ALD TiN. In: Proceedings of the 11th annual workshop on semiconductor advances for future electronics and sensors (SAFE 2008), 27-28 Nov 2008, Veldhoven, The Netherlands. pp. 468-471. Technology Foundation STW. ISBN 978-90-73461-56-7

Boogaard, A. and Kovalgin, A.Y. and Brunets, I. and Aarnink, A.A.I. and Holleman, J. and Wolters, R.A.M. and Schmitz, J. (2007) Characterization of SiO₂ films deposited at low temperature by means of remote ICPECVD Surface & coatings technology, 201. pp. 8976-8980. ISSN 0257-8972 *** ISI Impact 2,135 ***

Boogaard, A. and Kovalgin, A.Y. and Brunets, I. and Aarnink, A.A.I. and Wolters, R.A.M. and Holleman, J. and Schmitz, J. (2007) On the verification of EEDFs in plasmas with silane using optical emission spectroscopy. ECS Transactions, 6 (1). pp. 259-270. ISSN 1938-5862

Boogaard, A. and Kovalgin, A.Y. and Brunets, I. and Holleman, J. and Schmitz, J. (2007) Optical and Electrical Characterization of SiO₂ films deposited at low temperature by means of remote ICPECVD In: Proceedings of the 10th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, 29 - 30 Nov 2007, Veldhoven, The Netherlands. pp. 404-407. Technology Foundation STW. ISBN 978-90-73461-49-9

Brunets, I. and Aarnink, A.A.I. and Boogaard, A. and Kovalgin, A.Y. and Wolters, R.A.M. and Holleman, J. and Schmitz, J. (2007) Low-temperature LPCVD of Si nanocrystals from disilane and trisilane (Silcore®) embedded in ALD-alumina for non-volatile memory devices. Surface & Coatings Technology, 201. pp. 9209-9214. ISSN 0257-8972 *** ISI Impact 2,135 ***

Brunets, I. and Boogaard, A. and Aarnink, A.A.I. and Kovalgin, A.Y. and Wolters, R.A.M. and Holleman, J. and Schmitz, J. (2007) Low-temperature process steps for realization of non-volatile memory devices. In: 10th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors (SAFE), 29-30 Nov 2007, Veldhoven, The Netherlands. pp. 504-508. Technology Foundation STW. ISBN 978-90-73461-49-9

Kovalgin, A.Y. and Boogaard, A. and Brunets, I. and Holleman, J. and Schmitz, J. (2007) Chemical modeling of a high-density inductively-coupled plasma reactor containing silane. Surface & Coatings Technology, 201. pp. 8849-8853. ISSN 0257-8972 *** ISI Impact 2,135 ***

Boogaard, A. and Kovalgin, A.Y. and Aarnink, A.A.I. and Wolters, R.A.M. and Holleman, J. and Brunets, I. and Schmitz, J. (2006) Langmuir-probe characterization of an inductively-coupled remote plasma system intended for CVD and ALD. ECS Transactions, 2 (7). pp. 181-191. ISSN 1938-5862

Boogaard, A. and Kovalgin, A.Y. and Aarnink, A.A.I. and Wolters, R.A.M. and Holleman, J. and Brunets, I. and Schmitz, J. (2006) Measurement of electron temperatures of Argon Plasmas in a High-Density Inductively-Coupled Remote Plasma System by Langmuir Probe and Optical-Emission Spectroscopy. In: Proceedings of the 9th annual workshop on Semiconductor Advances for Future Electronics and Sensors 2006, 23-24 Nov 2006, Veldhoven, The Netherlands. pp. 412-418. Technology Foundation STW. ISBN 978-90-73461-44-4

Brunets, I. and van Hemert, T. and Boogaard, A. and Aarnink, A.A.I. and Kovalgin, A.Y. and Holleman, J. and Schmitz, J. (2006) Memory devices with encapsulated Si nano-crystals: Realization and Characterization. In: Proceedings of the 9th annual workshop on Semiconductor Advances for Future Electronics and Sensors 2006, 23-24 Nov 2006, Veldhoven, The Netherlands. pp. 419-422. Technology Foundation STW. ISBN 978-90-73461-44-4

Brunets, I. and Holleman, J. and Kovalgin, A.Y. and Aarnink, A.A.I. and Boogaard, A. and Oesterlin, P. and Schmitz, J. (2006) A green laser Crystallization of α-Si Films using preformed α-Si Lines. In: Proceedings of the 210th Electrochemical Society meeting, 29 okt - 03 nov 2006, Cancun. Mexico. pp. 185-191. ECS Transactions 3, 8 (2006). ECS. ISBN 1-56677-508-6

Aarnink, A.A.I. and Boogaard, A. and Brunets, I. and Isai, I.G. and Kovalgin, A.Y. and Holleman, J. and Wolters, R.A.M. and Schmitz, J. (2005) A high-density inductively-coupled remote plasma system for the deposition of dielectrics and semiconductors. In: 8th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors 2005 (SAFE 2005), 17-18 November 2005, Veldhoven, the Netherlands. pp. 67-69. Technology Foundation STW. ISBN 90-73461-50-2

Brunets, I. and Boogaard, A. and Isai, I.G. and Aarnink, A.A.I. and Kovalgin, A.Y. and Holleman, J. and Schmitz, J. (2005) Three-dimensional IC's prolong the life of Moore's law. In: 8th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors 2005 (SAFE 2005), 17-18 November 2005, Veldhoven, the Netherlands. pp. 76-78. Technology Foundation STW. ISBN 90-73461-50-2