EEMCS

Wang, Zhichun and Ackaert, J.G.G. and Salm, C. and Kuper, F.G. and Bessemans, K. and de Backer, E. (2003) "Plasma charging damage induced by a power ramp down step in the end of plasma enhanced chemical vapour deposition (PECVD) process. In: Proceedings of the 6th annual workshop on Semiconductor Advances for Future Electronics and Sensors SAFE 2003, 25 - 26 November 2003, Veldhoven, The Netherlands. pp. 766-770. Technology Foundation STW. ISBN 90-73461-39-1