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2008
Jinesh, K.B. and Lamy, Y. and Wolters, R.A.M. and Klootwijk, J.H. and Tois, E. and Roozeboom, F. and Besling, W.F.A.
(2008)
Silicon out-diffusion and aluminum in-diffusion in devices with atomic-layer deposited La2O3 thin films
Applied physics letters, 93 (19).
192912.
ISSN 0003-6951
*** ISI Impact 3,820 ***
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