EEMCS

Hof, A.J. and Hoekstra, E. and Kovalgin, A.Y. and van Schaijk, R. and Baks, W.M. and Schmitz, J. (2005) The impact of deuterated CMOS processing on gate oxide reliability. IEEE Transactions on Electron Devices, 52 (9). pp. 2111-2115. ISSN 0018-9383 *** ISI Impact 2,255 ***

Hof, A.J. and Kovalgin, A.Y. and van Schaijk, R. and Baks, W.M. and Schmitz, J. (2004) Gate oxide reliability and deuterated CMOS processing. In: IEEE Integrated Reliability Workshop, 18-21 October 2004, Lake Tahoe, USA. pp. 7-10. IEEE Computer Society. ISBN 0-7803-8517-9