EEMCS EPrints Service
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2011
Büyükköse, S. and Vratzov, B. and van der Wiel, W.G.
(2011)
High-quality global hydrogen silsequioxane contact planarization for nanoimprint lithography.
Jounal of Vacuum Science and Technology B, 29 (2).
0216021-0216026.
ISSN 1071-1023
*** ISI Impact 1,268 ***
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