EEMCS

Sarajlic, E. and de Boer, M.J. and Jansen, H.V. and Arnal, N. and Puech, M. and Krijnen, G.J.M. and Elwenspoek, M.C. (2005) Bulk micromachining technology for fabrication of two-level mems in standard silicon substrate. In: Proceedings of the 13th International Conference on Solid-State Sensors, Actuators and Microsystems 2005, 5-9 June 2005, Seoul. pp. 1404-1405. IEEE Computer Society. ISBN 0-7803-8994-8

Sarajlic, E. and de Boer, M.J. and Jansen, H.V. and Arnal, N. and Puech, M. and Krijnen, G.J.M. and Elwenspoek, M.C. (2004) Advanced plasma processing combined with trench isolation technology for fabrication and fast prototyping of high aspect ratio MEMS in standard silicon wafers. Journal of micromechanics and microengineering, 14. S70-S75. ISSN 0960-1317 *** ISI Impact 2,276 ***

Sarajlic, E. and de Boer, M.J. and Jansen, H.V. and Arnal, N. and Puech, M. and Krijnen, G.J.M. and Elwenspoek, M.C. (2003) Integration of trench isolation technolgy and plasma release for advanced MEMS design on standard silicon wafers. In: 14th MicroMechanics Europe Workshop, MME 2003, 2-4 Nov 2003, Delft. pp. 123-126. Eburon. ISBN 9080826618