EEMCS

Kazmi, S.N.R. and Aarnink, A.A.I. and Kovalgin, A.Y. and Salm, C. and Schmitz, J. (2011) Low Stress In Situ Boron Doped Poly SiGe Layers for MEMS Modular Integration with CMOS. ECS Transactions, 35 (30). pp. 45-52. ISSN 1938-5862

Van Hao, B. and Aarnink, A.A.I. and Kovalgin, A.Y. and Wolters, R.A.M. (2011) Ultra-Thin Atomic Layer Deposited TiN Films: Non-Linear I–V Behaviour and the Importance of Surface Passivation. Journal of nanoscience and nanotechnology, 11 (9). pp. 8120-8125. ISSN 1533-4880 *** ISI Impact 1,351 ***

Van Hao, B. and Groenland, A.W. and Aarnink, A.A.I. and Wolters, R.A.M. and Schmitz, J. and Kovalgin, A.Y. (2011) Growth Kinetics and Oxidation Mechanism of ALD TiN Thin Films Monitored by In Situ Spectroscopic Ellipsometry. Journal of the Electrochemical Society, 158 (3). pp. 214-220. ISSN 0013-4651 *** ISI Impact 2,420 ***

Kaleli, B. and Aarnink, A.A.I. and Smits, S.M. and Hueting, R.J.E. and Wolters, R.A.M. and Schmitz, J. (2010) Electron Beam Lithography of HSQ and PMMA Resists and Importance of their Properties to Link the Nano World to the Micro World. In: Proceeding of STW.ICT Conference 2010, 18-19 Nov 2010, Veldhoven, The Netherlands. pp. 105-108. Technology Foundation STW. ISBN 978-90-73461-67-3

Kazmi, S.N.R. and Rangarajan, B. and Aarnink, A.A.I. and Salm, C. and Schmitz, J. (2010) Low Stressed In-situ Boron doped Poly SiGe Layers for High-Q Resonators. In: Proceedings of the STW.ICT Conference 2010, 18-19 Nov 2010, Veldhoven, The Netherlands. pp. 109-113. Technology Foundation STW. ISBN 978-90-73461-67-3

Aarnink, A.A.I. and Van Bui, B. and Kovalgin, A.Y. and Wolters, R.A.M. (2009) In-situ monitoring of growth and oxidation of ALD TiN layers followed by reduction in atomic hydrogen. In: Proceedings of the 9th International conference on Atomic Layer Deposition, 19-22 Jul 2009, Monterey, CA, USA. America Vaccum Society, Omnipress. ISBN not assigned

Brunets, I. and Boogaard, A. and Smits, S.M. and de Vries, H. and Aarnink, A.A.I. and Holleman, J. and Kovalgin, A.Y. and Schmitz, J. (2009) Low temperature TFTs with poly-stripes. In: Proceedings of the 5th International Thin Film Transistor Conference ITC'09, 5-6 Mar 2009, Palaiseau, France. pp. 62-65. Ecole Polytechnique. ISBN not assigned

Kovalgin, A.Y. and Boogaard, A. and Brunets, I. and Aarnink, A.A.I. and Wolters, R.A.M. (2009) Electrical properties of plasma-deposited silicon oxide clarified by chemical modeling. ECS Transactions, 25 (8). pp. 23-32. ISSN 1938-5862

Rajasekharan, B. and Salm, C. and Wolters, R.A.M. and Aarnink, A.A.I. and Boogaard, A. and Schmitz, J. (2009) Metal contacts to lowly doped Si and ultra thin SOI. In: Proceedings of Fifth Workshop of the Thematic Network on Silicon on Insulator Technology, Devices and Circuits, 19-21 Jan 2009, Gotheburg, Sweden. pp. 29-30. Chalmers University of Technology. ISBN not assigned

Van Hao, B. and Aarnink, A.A.I. and Kovalgin, A.Y. and Wolters, R.A.M. and Schmitz, J. (2009) Thermal atomic layer deposition and oxidation of TiN monitored by in-situ spectroscopic ellipsometry. In: Proceedings of the 12th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, 26-27 Nov 2009, Veldhoven, The Netherlands. pp. 59-62. Technology Foundation STW. ISBN 978-90-73461-62-8

Boogaard, A. and Roesthuis, R. and Brunets, I. and Aarnink, A.A.I. and Kovalgin, A.Y. and Holleman, J. and Wolters, R.A.M. and Schmitz, J. (2008) Deposition of High-Quality SiO₂ Insulating Films at Low Temperatures by means of Remote PECVD In: Proceedings of the 11th annual workshop on semiconductor advances for future electronics and sensors (SAFE 2008), 27-28 Nov 2008, Veldhoven, The Netherlands. pp. 452-456. Technology Foundation STW. ISBN 978-90-73461-56-7

Brunets, I. and Groenland, A.W. and Boogaard, A. and Aarnink, A.A.I. and Kovalgin, A.Y. (2008) A study of thermal oxidation and plasma-enhanced oxidation/reduction of ALD TiN layers. In: Proceedings of the 18th International Conference on Atomical Layer Deposition ALD 2008, 29 Jun - 2 Jul 2008, Bruges, Belgium. P-54. TUe Eindhoven. ISBN not assigned

Brunets, I. and van Loon, R.V.A. and Walters, R.J. and Polman, A. and Boogaard, A. and Aarnink, A.A.I. and Kovalgin, A.Y. and Wolters, R.A.M. and Holleman, J. and Schmitz, J. (2008) Light emission from silicon nanocrystals embedded in ALD-alumina at low temperatures. In: Proceedings of the 11th annual workshop on semiconductor advances for future electronics and sensors (SAFE 2008), 27-28 Nov 2008, Veldhoven, The Netherlands. pp. 399-402. Technology Foundation STW. ISBN 978-90-73461-56-7

Groenland, A.W. and Brunets, I. and Boogaard, A. and Aarnink, A.A.I. and Kovalgin, A.Y. and Schmitz, J. (2008) Thermal and plasma-enhanced oxidation of ALD TiN. In: Proceedings of the 11th annual workshop on semiconductor advances for future electronics and sensors (SAFE 2008), 27-28 Nov 2008, Veldhoven, The Netherlands. pp. 468-471. Technology Foundation STW. ISBN 978-90-73461-56-7

Boogaard, A. and Kovalgin, A.Y. and Brunets, I. and Aarnink, A.A.I. and Holleman, J. and Wolters, R.A.M. and Schmitz, J. (2007) Characterization of SiO₂ films deposited at low temperature by means of remote ICPECVD Surface & coatings technology, 201. pp. 8976-8980. ISSN 0257-8972 *** ISI Impact 2,135 ***

Boogaard, A. and Kovalgin, A.Y. and Brunets, I. and Aarnink, A.A.I. and Wolters, R.A.M. and Holleman, J. and Schmitz, J. (2007) On the verification of EEDFs in plasmas with silane using optical emission spectroscopy. ECS Transactions, 6 (1). pp. 259-270. ISSN 1938-5862

Brunets, I. and Aarnink, A.A.I. and Boogaard, A. and Kovalgin, A.Y. and Wolters, R.A.M. and Holleman, J. and Schmitz, J. (2007) Low-temperature LPCVD of Si nanocrystals from disilane and trisilane (Silcore®) embedded in ALD-alumina for non-volatile memory devices. Surface & Coatings Technology, 201. pp. 9209-9214. ISSN 0257-8972 *** ISI Impact 2,135 ***

Brunets, I. and Boogaard, A. and Aarnink, A.A.I. and Kovalgin, A.Y. and Wolters, R.A.M. and Holleman, J. and Schmitz, J. (2007) Low-temperature process steps for realization of non-volatile memory devices. In: 10th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors (SAFE), 29-30 Nov 2007, Veldhoven, The Netherlands. pp. 504-508. Technology Foundation STW. ISBN 978-90-73461-49-9

Blanco Carballo, V.M. and Chefdeville, M.A. and van der Graaf, H. and Salm, C. and Aarnink, A.A.I. and Smits, S.M. and Altpeter, D.M. and Timmermans, J. and Visschers, J.L. and Schmitz, J. (2006) A miniaturized multiwire proportional chamber using CMOS wafer scale post-processing. In: Proceedings of 32nd European Solid State Device Research Conference, 02-06 July 2006, Montreux, Switzerland. pp. 129-132. IEEE Computer Society. ISBN 1-4244-0301-4

Boogaard, A. and Kovalgin, A.Y. and Aarnink, A.A.I. and Wolters, R.A.M. and Holleman, J. and Brunets, I. and Schmitz, J. (2006) Langmuir-probe characterization of an inductively-coupled remote plasma system intended for CVD and ALD. ECS Transactions, 2 (7). pp. 181-191. ISSN 1938-5862

Boogaard, A. and Kovalgin, A.Y. and Aarnink, A.A.I. and Wolters, R.A.M. and Holleman, J. and Brunets, I. and Schmitz, J. (2006) Measurement of electron temperatures of Argon Plasmas in a High-Density Inductively-Coupled Remote Plasma System by Langmuir Probe and Optical-Emission Spectroscopy. In: Proceedings of the 9th annual workshop on Semiconductor Advances for Future Electronics and Sensors 2006, 23-24 Nov 2006, Veldhoven, The Netherlands. pp. 412-418. Technology Foundation STW. ISBN 978-90-73461-44-4

Brunets, I. and van Hemert, T. and Boogaard, A. and Aarnink, A.A.I. and Kovalgin, A.Y. and Holleman, J. and Schmitz, J. (2006) Memory devices with encapsulated Si nano-crystals: Realization and Characterization. In: Proceedings of the 9th annual workshop on Semiconductor Advances for Future Electronics and Sensors 2006, 23-24 Nov 2006, Veldhoven, The Netherlands. pp. 419-422. Technology Foundation STW. ISBN 978-90-73461-44-4

Brunets, I. and Holleman, J. and Kovalgin, A.Y. and Aarnink, A.A.I. and Boogaard, A. and Oesterlin, P. and Schmitz, J. (2006) A green laser Crystallization of α-Si Films using preformed α-Si Lines. In: Proceedings of the 210th Electrochemical Society meeting, 29 okt - 03 nov 2006, Cancun. Mexico. pp. 185-191. ECS Transactions 3, 8 (2006). ECS. ISBN 1-56677-508-6

Aarnink, A.A.I. and Boogaard, A. and Brunets, I. and Isai, I.G. and Kovalgin, A.Y. and Holleman, J. and Wolters, R.A.M. and Schmitz, J. (2005) A high-density inductively-coupled remote plasma system for the deposition of dielectrics and semiconductors. In: 8th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors 2005 (SAFE 2005), 17-18 November 2005, Veldhoven, the Netherlands. pp. 67-69. Technology Foundation STW. ISBN 90-73461-50-2

Brunets, I. and Boogaard, A. and Isai, I.G. and Aarnink, A.A.I. and Kovalgin, A.Y. and Holleman, J. and Schmitz, J. (2005) Three-dimensional IC's prolong the life of Moore's law. In: 8th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors 2005 (SAFE 2005), 17-18 November 2005, Veldhoven, the Netherlands. pp. 76-78. Technology Foundation STW. ISBN 90-73461-50-2

Bystrova, S. and Aarnink, A.A.I. and Holleman, J. and Wolters, R.A.M. (2005) Atomic layer deposition of W_1.5N barrier films for Cu Metallization Journal of The Electrochemical Society, 152 (7). G522-527. ISSN 0013-4651 *** ISI Impact 2,420 ***

Bystrova, S. and Holleman, J. and Aarnink, A.A.I. and Wolters, R.A.M. (2005) Barrier properties of ALD1,5N thin films. In: International Conference on Advanced Metallization, 19-21 October 2004, San Diego, California, USA. pp. 769-774. Materials Research Society. ISBN 978-15589-9814-8

Bankras, R.G. and Aarnink, A.A.I. and Holleman, J. and Schmitz, J. (2003) In-situ RHEED analysis of atomic layer deposition and characterization of Al₂0₃ gate dielectrics In: Proceedings of the 6th annual workshop on Semiconductor Advances for Future Electronics and Sensors SAFE 2003, 25 - 26 November 2003, Veldhoven, The Netherlands. pp. 726-729. Technology Foundation STW. ISBN 90-73461-39-1

Bystrova, S. and Holleman, J. and Wolters, R.A.M. and Aarnink, A.A.I. (2003) Atomic layer deposition of W - based layers on SiO₂ In: Proceedings of the 6th annual workshop on Semiconductor Advances for Future Electronics and Sensors SAFE 2003, 25 - 26 November 2003, Veldhoven, The Netherlands. pp. 730-734. Technology Foundation STW. ISBN 90-73461-39-1