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Soest, F.J. and van Wolferen, H.A.G.M. and Hoekstra, H.J.W.M. and de Ridder, R.M. and Wörhoff, K. and Lambeck, P.V.
(2005)
Laser interference lithography with highly accurate interferometric alignment.
Japanese journal of applied physics part 1 Regular papers and short notes, 44 (9A).
pp. 6568-6570.
ISSN 0021-4922
*** ISI Impact 1,018 ***
Full text available as:
Official URL: http://dx.doi.org/10.1143/JJAP.44.6568  AbstractIt is shown experimentally that in laser interference lithography, by using a reference grating, respective grating layers can be positioned with high relative accuracy. A 0.001 angular and a few nanometers lateral resolution have been demonstrated.
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