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1914 Laser interference lithography with highly accurate interferometric alignment

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Soest, F.J. and van Wolferen, H.A.G.M. and Hoekstra, H.J.W.M. and de Ridder, R.M. and Wörhoff, K. and Lambeck, P.V. (2005) Laser interference lithography with highly accurate interferometric alignment. In: Twelfth European Conference on Integrated Optics, ECIO'05, 6-8 Apr 2005, Grenoble, France. pp. 570-573. Minatec. ISBN not assigned

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Abstract

It is shown experimentally that in laser interference lithography, by using a reference grating, respective grating
layers can be positioned with high relative accuracy. A 0.001 degree angular and a few nanometers lateral resolution
have been demonstrated.

Item Type:	Conference or Workshop Paper (Extended Abstract, Poster)
Research Group:	EWI-IOMS: Integrated Optical MicroSystems
Research Program:	MESA-NanoFabrication
Research Project:	LIL: Laser Interference Lithography for submicron magnetic optical and micromechanic devices
ID Code:	1914
Status:	Published
Deposited On:	19 June 2006
Refereed:	Yes
International:	Yes
More Information:	statistics metis

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