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17931 Ti:sapphire rib channel waveguide fabricated by reactive ion etching of a planar waveguide

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Crunteanu, A. and Jänchen, G. and Salathé, R.P. and Hoffmann, P. and Pollnau, M. and Eason, R.W. and Shepherd, D.P. (2002) Ti:sapphire rib channel waveguide fabricated by reactive ion etching of a planar waveguide. In: Conference on Lasers and Electro-Optics, May 2002, Long Beach, CA. 265. Optical Society of America. ISBN 1-55752-706-7

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Official URL: http://dx.doi.org/10.1109/CLEO.2002.1033928

Abstract

We were successful in creating 1.4-µm high ribs in a Ti:sapphire planar waveguide by reactive ion etching. Optical investigations of the obtained structure showed channel-waveguide fluorescence emission of the Ti:sapphire layer after Ar-ion excitation.

Item Type:	Conference or Workshop Paper (Extended Abstract, Talk)
Research Group:	EWI-IOMS: Integrated Optical MicroSystems
Uncontrolled Keywords:	optical fabrication, optical planar waveguides, optical pumping, sapphire, solid lasers, sputter etching, titanium, waveguide lasers
ID Code:	17931
Status:	Published
Deposited On:	04 June 2010
Refereed:	Yes
International:	Yes
More Information:	statistics

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