Nederlands
Contact
Search
OrganisationEEMCS EPrints Service
 |
|
|
||||||||||||||||||||||||||||||||||
|
|
|
|
|
||||||||||||||||||||||||||||||||
|
|
|
||||||||||||||||||||||||||||||||||
|
|
|
|
|
||||||||||||||||||||||||||||||||
|
|
Wali, F. and Knotter, D.M. and Kuper, F.G.
(2008)
Liquid-borne nano particles impact on the random yield during critical processes in IC’s production.
In: Proceedings of the 11th annual workshop on semiconductor advances for future electronics and sensors (SAFE 2008), 27-28 Nov 2008, Veldhoven, The Netherlands.
pp. 513-515.
Technology Foundation STW.
ISBN 978-90-73461-56-7
Full text available as:
 AbstractSemiconductor industry faces a continuous challenge to decrease the transistor size as well as to increase the yield by eliminating defect sources. One of the sources of particle defects is ultra pure water used in different production tools at different stages of processing. In this paper, particle count data measured in ultra pure water is related to the yield of two large size products. An impact of nano-particle present in ultra pure water on yield of up to 4-6% has been found in two different products.
Export this item as: To request a copy of the PDF please email us request copy To correct this item please ask your editor Repository Staff Only: edit this item |
|
|
||||||||||||||||||||||||||||||||
|
|
|
||||||||||||||||||||||||||||||||||
|
|
|
|
|
||||||||||||||||||||||||||||||||
|
|
|
||||||||||||||||||||||||||||||||||
