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Berenschot, J.W. and Tas, N.R. and Lammerink, T.S.J. and Elwenspoek, M.C. and van den Berg, A.
(2002)
Advanced sacrificial poly-Si technology for fluidic systems.
Journal of micromechanics and microengineering, 12 (5).
pp. 621-624.
ISSN 0960-1317
*** ISI Impact 2,105 ***
Full text available as:
Official URL: http://dx.doi.org/10.1088/0960-1317/12/5/317 AbstractSacrificial poly-Si etching can be used to create thin cavities and channels. By combining it with anisotropic KOH etching of a mono-Si substrate, important components for fluidic systems, such as V-grooved channels, thin sandwiched channels, channel crossings and membrane filters and injectors, have been fabricated in a single etch step.
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